The higher that the intensity of electromagnetic energy is, upon the proximal locus of the topological stratum of a given arbitrary orbifold eigenset, over a set group-metric of time, -- the more that there will be the potential tendency of there then being a higher density of infrared photons, that are to likely be at the said proximal locus of the topological stratum of the respective given arbitrary orbifold eigenset, over that same said group-related metric. As said before, the higher that the intensity is, of infrared photons upon the proximal locus of the topological stratum of a given arbitrary orbifold eigenset, the more of a chance that such a tendency alone will then work to involve the resultant causation of oscillation-based distortions upon the said respective orbifold eigenset of topological stratum. Therefore, the higher that the intensity of electromagnetic energy is, upon the proximal locus of the holonomic substrate of an orbifold eigenset of topological stratum is, the more likely that the correlative orbifold eigenset is to then to work to bear a higher tense of substringular abrasion -- since such an individually taken factor will tend to increase the tendency of working to form oscillation-based distortions upon the topological surface of the holonomic substrate of such a said respective given arbitrary orbifold eigenset --- if over the same duration of group-related metric.
I will continue with the suspense later! To Be Continued! Sincerely, Samuel David Roach.
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